Vacuum Plasma System
PE Mode (Surface Treatment)
COVANCE
Vacuum Plasma System – Tabletop
Process Mode | PE |
---|---|
Chamber | W.200 x D.220 x H.160 (mm) |
Generator | 20~100kHz Max. 200W / 13.56MHz Max. 300W |
MFC | Max. 200 sccm |
Gauge Pressure | Atm ~ 5 x 10-4 Torr |
Operation | Manual & Automatic |
Geometry | W.510 x D.525 x H.640 (mm) |
Technical Data
Process Chamber
- Plasma Mode : PE (Plasma Etching) Mode with single electrode
- Size : 200×220×160 (W×D×H, mm)
- Single Block Aluminum (Not welded, Minimized gas leak)
- Uniform gas flow design (Patent No. 10-1697205)
Generator
- Frequency : 20~100kHz (10kHz increment)
- Power : Max. 200W (Adjustable in 1W increment)
- (Opt.) RF(13.56MHz) with Max. 300W
- Automatic Impedance Matching
- Process Monitoring and Control
Gas flow module
- Maximum Number of gas channels : × 4 lines
- Gas flow control : High repeatability MFC
- Purge line : × 1 ea
- Vent line : × 1 ea
- MFC Flow rate : Max.200 sccm (1 sccm increment)
Vacuum Package
- Gauge : Pirani (5×10-4 Torr)
- Pump : Oil Rotary Pump
- Pump displacement : 290L/min @ 60Hz
- Ultimate Pressure : 5×10-3 Torr
Controller
- DSP on board signal controller
- Automatic / Manual operation
- Interactive integrated software
- 7” Touchscreen PC & USB data transfer
- Saving and loading of process recipes
- Process graphs and alarm log loading
System Dimension
- Main System : 510×525×640 (W×D×H, mm)
- Vacuum Pump : 480×160×250 (W×D×H, mm)
Chamber structure