Plasma Technology

Vacuum Chamber Technology 2023-07-24T02:10:40+00:00

Vacuum Chamber Technology

Unlike conventional vacuum chamber, Femtoscience inc. produces a unique
chamber that maintains a uniform gas flow inside the chamber regardless of the position.

Plasma Etching Mode
Single Electrode

Structures of the chambers divide into horizontal and vertical types depending on the direction of the gas flow.
Femtoscience Inc.’s patented chamber provides excellent process uniformity (Patent No. 10-1701381, 10-1697205, Korea)