Vacuum Plasma System
PE Mode (Surface Treatment)
CUTE
Vacuum Plasma System – Table top
| Process Mode | PE | 
|---|---|
| Chamber | W.140 x D.200 x H.110 (mm) | 
| Generator | 20~100kHz Max. 100W | 
| MFC | Max. 100 sccm | 
| Gauge Pressure | Atm ~ 5 x 10-4 Torr | 
| Operation | Manual & Automatic | 
| Geometry | W.440 x D.500 x H.560 (mm) | 
Technical Data
Process Chamber
- Plasma Mode : PE (Plasma Etching) Mode with single electrode
 - Size : 140×200×110 (W×D×H, mm)
 - Single Block Aluminum (Not welded, Minimized gas leak)
 - Uniform gas flow design (Patent No. 10-1697205)
 
Generator
- Frequency : 20~100kHz (10kHz increment)
 - Powe r: Max. 100W (Adjustable in 1W increment)
 - Automatic Impedance Matching
 - Process Monitoring and Control
 
Gas flow module
- Maximum Number of gas channels : ×3 lines
 - Gas flow control : High repeatability MFC
 - Purge line : ×1 ea
 - Vent line : ×1 ea
 - MFC Flow rate : Max.100 sccm (1 sccm increment)
 
Vacuum Package
- Gauge : Pirani (5×10-4 Torr)
 - Pump : Oil Rotary Pump
 - Pump displacement : 200L/min @ 60Hz
 - Ultimate Pressure : 5×10-3 Torr
 
Controller
- DSP on board signal controller
 - Automatic / Manual operation
 - Interactive integrated software
 - 7” Touchscreen PC & USB data transfer
 - Saving and loading of process recipes
 - Process graphs and alarm log loading
 
System Dimension
- Main System : 440×500×560 (W×D×H, mm)
 - Vacuum Pump : 460×160×250 (W×D×H, mm)
 
Chamber structure









