Vacuum Chamber Technology
Unlike conventional vacuum chamber, Femtoscience inc. produces a unique
chamber that maintains a uniform gas flow inside the chamber regardless of the position.
Plasma Etching Mode
Single Electrode
PE / RIE (Reactive Ion Etching) Mode
Dual Electrode
Structures of the chambers divide into horizontal and vertical types depending on the direction of the gas flow.
Femtoscience Inc.’s patented chamber provides excellent process uniformity (Patent No. 10-1701381, 10-1697205, Korea)