Vacuum Plasma System
PE Mode (Surface Treatment)
CUTE
Vacuum Plasma System – Table top
Process Mode | PE |
---|---|
Chamber | W.140 x D.200 x H.110 (mm) |
Generator | 20~100kHz Max. 100W |
MFC | Max. 100 sccm |
Gauge Pressure | Atm ~ 5 x 10-4 Torr |
Operation | Manual & Automatic |
Geometry | W.440 x D.500 x H.560 (mm) |
Technical Data
Process Chamber
- Plasma Mode : PE (Plasma Etching) Mode with single electrode
- Size : 140×200×110 (W×D×H, mm)
- Single Block Aluminum (Not welded, Minimized gas leak)
- Uniform gas flow design (Patent No. 10-1697205)
Generator
- Frequency : 20~100kHz (10kHz increment)
- Powe r: Max. 100W (Adjustable in 1W increment)
- Automatic Impedance Matching
- Process Monitoring and Control
Gas flow module
- Maximum Number of gas channels : ×3 lines
- Gas flow control : High repeatability MFC
- Purge line : ×1 ea
- Vent line : ×1 ea
- MFC Flow rate : Max.100 sccm (1 sccm increment)
Vacuum Package
- Gauge : Pirani (5×10-4 Torr)
- Pump : Oil Rotary Pump
- Pump displacement : 200L/min @ 60Hz
- Ultimate Pressure : 5×10-3 Torr
Controller
- DSP on board signal controller
- Automatic / Manual operation
- Interactive integrated software
- 7” Touchscreen PC & USB data transfer
- Saving and loading of process recipes
- Process graphs and alarm log loading
System Dimension
- Main System : 440×500×560 (W×D×H, mm)
- Vacuum Pump : 460×160×250 (W×D×H, mm)
Chamber structure